1 |
Experimental determination of dependence of vertical growth rate on surface supersaturation in GaAs(001) microchannel epitaxy and growth optimization Tomita M, Mizuno Y, Takakura H, Kambayashi D, Naritsuka S, Maruyama T Journal of Crystal Growth, 440, 13, 2016 |
2 |
A new way to achieve dislocation-free heteroepitaxial growth by molecular beam epitaxy: vertical microchannel epitaxy Matsunaga Y, Naritsuka S, Nishinaga T Journal of Crystal Growth, 237, 1460, 2002 |
3 |
Interface-supersaturation estimated from the shape of steps on the surface of InP MCE by LPE Naritsuka S, Nishinaga T Journal of Crystal Growth, 222(1-2), 14, 2001 |
4 |
Lateral growth in molecular beam epitaxy by low angle incidence microchannel epitaxy Bacchin G, Umeno A, Nishinaga T Applied Surface Science, 159, 270, 2000 |
5 |
A new way to achieve both selective and lateral growth by molecular beam epitaxy: low angle incidence microchannel epitaxy Bacchin G, Nishinaga T Journal of Crystal Growth, 208(1-4), 1, 2000 |
6 |
Two-dimensional numerical calculation of solute diffusion in microchannel epitaxy of InP Yan Z, Naritsuka S, Nishinaga T Journal of Crystal Growth, 209(1), 1, 2000 |
7 |
Optimization of InP microchannel epitaxy on Si substrate achieved by addition of upper source Naritsuka S, Nishinaga T, Tachikawa M, Mori H Journal of Crystal Growth, 211(1-4), 395, 2000 |
8 |
Coalescence in microchannel epitaxy of InP Yan Z, Hamaoka Y, Naritsuka S, Nishinaga T Journal of Crystal Growth, 212(1-2), 1, 2000 |
9 |
AFM analysis of sidewall formation in low angle incidence microchannel epitaxy of GaAs Umeno A, Bacchin G, Nishinaga T Journal of Crystal Growth, 220(4), 355, 2000 |