| 1 |
Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer
Yuan C, Jin KK, Li K, Diao S, Tong JW, Fang Q
Advanced Materials, 25(35), 4875, 2013 |
| 2 |
The effects of UV radiation on SiC(O)N/SiOC(-H) thin films grown on Si substrates using plasma-enhanced atomic layer deposition
Navamathavan R, Kim CY, Lee HJ, Yu Y, Choi CK
Thin Solid Films, 547, 151, 2013 |
| 3 |
Spectroscopic and capacitance-voltage characterization of thin aminopropylmethoxysilane films doped with copper phthalocyanine, tris(dimethylvinylsilyloxy)-POSS and fullerene cages
Klocek J, Henkel K, Kolanek K, Zschech E, Schmeisser D
Applied Surface Science, 258(10), 4213, 2012 |
| 4 |
Studies of fluorine-containing bismaleimide resins part I: Synthesis and characteristics of model compounds
Wang ZY, Ho JC, Shu WJ
Journal of Applied Polymer Science, 123(5), 2977, 2012 |
| 5 |
UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(-H) thin films for 45 nm technology node
Choi CK, Kim CY, Navamathavan R, Lee HS, Woo JK, Hyun MT, Lee HJ, Jeung WY
Current Applied Physics, 11(5), S109, 2011 |
| 6 |
Ultra low-dielectric-constant methylated mesoporous silica films with high hydrophobicity and stability
Yuan H, Xu JQ, Xie LL
Materials Chemistry and Physics, 129(3), 1195, 2011 |
| 7 |
Ultraviolet irradiation effect on the properties of leakage current and dielectric breakdown of low-dielectric-constant SiOC(-H) films using comb capacitor structure
Kim CY, Navamathavan R, Lee HS, Woo JK, Hyun MT, Lee KM, Jeung WY, Choi CK
Thin Solid Films, 519(20), 6732, 2011 |
| 8 |
Effect of evaporated copper and aluminum on post-annealed SiOC(-H) films deposited using plasma-enhanced chemical vapor deposition
Kim CY, Lee HS, Navamathavan R, Woo JK, Choi CK
Thin Solid Films, 518(22), 6469, 2010 |
| 9 |
Study of Cu diffusion behavior in low dielectric constant SiOC(-H) films deposited by plasma-enhanced chemical vapor deposition
Choi CK, Lee HS, Navamathavan R, Woo JK, Kim CY
Thin Solid Films, 518(22), 6474, 2010 |
| 10 |
Optical emission diagnostics of etching of low-k dielectrics in a two frequency inductively coupled plasma
Miyauchi M, Miyoshi Y, Petrovic ZL, Makabe T
Solid-State Electronics, 51(10), 1418, 2007 |
