화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Plasma potential measurement in 2.45 GHz electron cyclotron resonance plasma with a magnetron magnetic field configuration
Kim SB, Namkung W, Cho M, Kim DC, Yoo SJ
Thin Solid Films, 518(22), 6690, 2010
2 Towards quantitative depth profiling with high spatial and high depth resolution
Vanhove N, Lievens P, Vandervorst W
Applied Surface Science, 255(4), 1360, 2008
3 Determination of energy dependent ionization probabilities of sputtered particles
Mazarov P, Samartsev AV, Wucher A
Applied Surface Science, 252(19), 6452, 2006
4 Sputtering of ag under C60(+) and Ga+ projectile bombardment
Sun S, Szakal C, Smiley EJ, Postawa Z, Wucher A, Garrison BJ, Winograd N
Applied Surface Science, 231-2, 64, 2004
5 Molecular SIMS for organic layers: new insights
Bertrand P, Delcorte A, Garrison BJ
Applied Surface Science, 203, 160, 2003