| 1 |
Strain-free, single-phase metastable Ti0.38Al0.62N alloys with high hardness: metal-ion energy vs. momentum effects during film growth by hybrid high-power pulsed/dc magnetron cosputtering
Greczynski G, Lu J, Jensen J, Petrov I, Greene JE, Bolz S, Kolker W, Schiffers C, Lemmer O, Hultman L
Thin Solid Films, 556, 87, 2014 |
| 2 |
Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
Greczynski G, Jensen J, Hultman L
Thin Solid Films, 519(19), 6354, 2011 |
| 3 |
Modeling film uniformity and symmetry in ionized metal physical vapor deposition with cylindrical targets
Lu JQ, Yang L, Yoon JH, Cho TY, Tao GQ
Thin Solid Films, 517(2), 853, 2008 |
| 4 |
Ionized physical vapor deposition (IPVD): A review of technology and applications
Helmersson U, Lattemann M, Bohlmark J, Ehiasarian AP, Gudmundsson JT
Thin Solid Films, 513(1-2), 1, 2006 |
| 5 |
Titanium oxide thin films deposited by high-power impulse magnetron sputtering
Konstantinidis S, Dauchot JP, Hecq A
Thin Solid Films, 515(3), 1182, 2006 |
| 6 |
Sputter deposition modeling of Ti thin film on a sharp tip
Han HW, Lee NE
Thin Solid Films, 475(1-2), 144, 2005 |
