1 |
Inkjet Printing of SiO2 Hollow Spheres/Polyimide Hybrid Films for Foldable Low-k ILD Kim MK, Hwang SH, Jung HS, Oh TS, Kim JH, Yoo JB Macromolecular Research, 26(12), 1123, 2018 |
2 |
Mechanistic study on interlayer dielectric breakdown in integrated circuits Wang P Materials Chemistry and Physics, 128(3), 323, 2011 |
3 |
Plasma-enhanced chemical vapor deposition of carbon films using dibromoadamantane Shirafuji T, Nishimura Y, Tachibana K, Ishii H Thin Solid Films, 518(3), 993, 2009 |
4 |
Design of diffusion barriers Gill WN, Plawsky JL Thin Solid Films, 515(11), 4794, 2007 |
5 |
Comparisons on doping of different alkyl compound on SiO2 to form a low-k dielectric material Lim AYK, Ibrahim K Materials Science Forum, 480, 213, 2005 |
6 |
Application of SiO2 aerogel film for interlayer dielectric on GaAs with a barrier of Si3N4 Jung SB, Park SW, Yang JK, Park HH, Kim H Thin Solid Films, 447, 580, 2004 |
7 |
Low Dielectric Constant of MeV Ion-Implanted Poly(vinylidene fluoride) Lee SY, Kim BH, Park SK, Joo J, Beag YW, Koh SK Macromolecular Research, 11(1), 9, 2003 |
8 |
Temperature studies of optical birefringence and X-ray diffraction with poly(p-xylylene), poly(chloro-p-xylylene) and poly(tetrafluoro-p-xylylene) CVD thin films Senkevich JJ, Desu SB, Simkovic V Polymer, 41(7), 2379, 2000 |