| 1 |
Induction Plasma Synthesis of Graphene Nano-flakes with In Situ Investigation of Ar-H-2-CH4 Plasma by Optical Emission Spectroscopy
Mohanta A, Lanfant B, Leparoux M
Plasma Chemistry and Plasma Processing, 39(5), 1161, 2019 |
| 2 |
Strong Fermi-level pinning induced by argon inductively coupled plasma treatment and post-metal deposition annealing on 4H-SiC
Tsui BY, Cheng JC, Yen CT, Lee CY
Solid-State Electronics, 133, 83, 2017 |
| 3 |
Inter-laboratory comparison of SiO2 analysis for geothermal water chemistry
Verma MP, Izquierdo G, Urbino GA, Gangloff S, Garcia R, Aparicio A, Conte T, Armienta MA, Sanchez M, Gabriel JRP, Fajanela ID, Renderos R, Acha CBA, Prasetio R, Grajales IC, Delgado LR, Opondo K, Esparza RZ, Panama LA, Salazar RT, Lim PG, Javino F
Geothermics, 44, 33, 2012 |
| 4 |
High-density plasma nitriding of AISI 316L for bipolar plate in proton exchange membrane fuel cell
Hong W, Han DH, Choi H, Kim MW, Lee JJ
International Journal of Hydrogen Energy, 36(3), 2207, 2011 |
| 5 |
Application of methods (sequential extraction procedures and high-pressure digestion method) to fly ash particles to determine the element constituents: A case study for BCR 176
Chang CY, Wang CF, Mui DT, Chiang HL
Journal of Hazardous Materials, 163(2-3), 578, 2009 |
| 6 |
Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)
Jung HY, Park YR, Lee HJ, Lee NE, Jeong CY, Ahn J
Thin Solid Films, 517(14), 3938, 2009 |
| 7 |
The effect of the H-2 flow rate on the structure and optical properties of TiO2 films deposited by inductively coupled plasma assisted chemical vapor deposition
Jang DS, Lee HY, Lee JJ
Thin Solid Films, 517(14), 3967, 2009 |
| 8 |
Study of the inductively coupled plasma assisted DC magnetron sputtering (ICPDMS) during ITO deposition
Yang IH, Lee Y, Jang JN, Hong M
Thin Solid Films, 517(14), 4165, 2009 |
| 9 |
The effects of plasma treatment on the thermal stability of HfO2 thin films
Chang KM, Chen BN, Huang SM
Applied Surface Science, 254(19), 6116, 2008 |
| 10 |
Low temperature deposition of tin oxide films by inductively coupled plasma assisted chemical vapor deposition
Lee HY, Kim JN, Kim H, Jang DS, Lee JJ
Thin Solid Films, 516(11), 3538, 2008 |
