화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Experimental investigation on submerged gas-liquid mixture injection into water through a micro-channel
Hu L, Shen YN, Chen WY, Fu X
International Journal of Multiphase Flow, 83, 39, 2016
2 Polarimetric diagnosis of 193-nm lithography equipment using a mask with newly developed polarization optical elements
Nomura H
Thin Solid Films, 519(9), 2688, 2011
3 Fabrication for Cu/Hydrogen Silsesquioxane Damascene Structure by Nanoimprint
Hsu CC, Huang FS
Journal of the Electrochemical Society, 157(4), H443, 2010
4 Defectivity issues in topcoatless photoresists
Cantone J, van Dommelen Y, Jiang AQ, Dunn S, Winter T, Petrillo K, Johnson R, Lawson P, Conley W, Callahan R
Journal of Vacuum Science & Technology B, 27(6), 3014, 2009
5 Influences of water on photoresist surface in immersion lithography technology
Sado M, Teratani T, Fujii H, Iikawa R, Iida H
Applied Surface Science, 255(4), 1018, 2008
6 Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle
Kritsun O, Lalovic I, Rokitski S, Partlo B, La Fontaine B, Farrar N, Levinson H
Journal of Vacuum Science & Technology B, 26(6), 2145, 2008
7 Extreme ultraviolet lithography: Status and prospects
Benschop J, Banine V, Lok S, Loopstra E
Journal of Vacuum Science & Technology B, 26(6), 2204, 2008
8 Pattern specific optical models
Tejnil E, Adam K, Lam MC, Berger G
Journal of Vacuum Science & Technology B, 26(6), 2441, 2008