검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
A comparative study of CF4, Cl-2 and HBr + Ar inductively coupled plasmas for dry etching applications Efremov A, Lee J, Kwon KH Thin Solid Films, 629, 39, 2017 |
| 2 |
Hydrogen bromide plasma-copper reaction in a new copper etching process Lee S, Kuo Y Thin Solid Films, 457(2), 326, 2004 |