화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Low temperature high-rate growth of crystalline Ge films on quartz and crystalline Si substrates from VHF inductively-coupled plasma of GeH(4)
Sakata T, Makihara K, Deki H, Higashi S, Miyazaki S
Thin Solid Films, 517(1), 216, 2008
2 High rate growth of device-grade microcrystalline silicon films at 8 nm/s
Niikura C, Kondo M, Matsuda A
Solar Energy Materials and Solar Cells, 90(18-19), 3223, 2006
3 Influence of C/Si ratio on the 4H-SiC (0001) epitaxial growth and a keynote for high-rate growth
Ishida Y, Takahashi T, Kojima K, Okumura H, Arai K, Yoshida S
Materials Science Forum, 457-460, 213, 2004
4 A novel approach for the growth of Rc-Si at a high rate over 3 nm/s
Tanda M, Kondo M, Matsuda A
Thin Solid Films, 427(1-2), 33, 2003
5 Growth of device grade mu c-Si film at over 50 A/s using PECVD
Suzuki S, Kondo M, Matsuda A
Solar Energy Materials and Solar Cells, 74(1-4), 489, 2002
6 Numerical investigation of natural and forced solutal convection above the surface of a growing crystal
Brailovskaya VA, Zilberberg VV, Feoktistova LV
Journal of Crystal Growth, 210(4), 767, 2000