검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
High-density-plasma (HDP)-CVD oxide to thermal oxide wafer bonding for strained silicon layer transfer applications Singh R, Radu I, Reiche M, Himcinschi C, Kuck B, Tillack B, Gosele U, Christiansen SH Applied Surface Science, 253(7), 3595, 2007 |
| 2 |
Characterization of sputter-induced temperature effect in fluorine doped SiO2 film deposition by high-density plasma chemical vapor deposition Hsiao WC, Liu CP, Wang YL Thin Solid Films, 498(1-2), 20, 2006 |
| 3 |
Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean Lan JK, Wang YL Thin Solid Films, 469-470, 438, 2004 |
| 4 |
층간 절연막으로 응용하기 위한 저 유전체 불화탄소 플라즈마 고분자/SiO2 복합박막의 증착 김동선, 강나경 HWAHAK KONGHAK, 39(1), 77, 2001 |