검색결과 : 11건
No. | Article |
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1 |
Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering Boujamaa R, Martinez E, Pierre F, Renault O, Detlefs B, Zegenhagen J, Baudot S, Gros-Jean M, Bertin F, Dubourdieu C Applied Surface Science, 335, 71, 2015 |
2 |
Effect of crystallization on the reliability of unipolar resistive-switching in HfO2-based dielectrics Saleh MN, Venkatachalam DK, Elliman RG Current Applied Physics, 14, S88, 2014 |
3 |
Modelization of hafnium silicate chemical vapor deposition using tetrakis-diethyl-amino-hafnium and tetrakis-dimethyl-amino-silane Gros-Jean M, Bouvet P, Graoui H, Chu D, Larrnagnac D Thin Solid Films, 520(7), 2594, 2012 |
4 |
Low-Voltage P3HT Field-Effect Transistors Fabricated Using High-k Gate Insulators Yan H, Ikeda M, Kagata T, Okuzaki H Composite Interfaces, 18(3), 251, 2011 |
5 |
One-step growth of HfSiON films Xia B, Fisher ML, Stemper H, Misra A Thin Solid Films, 516(16), 5460, 2008 |
6 |
HfSiO/SiO(2)- and SiO(2)/HfSiO/SiO(2)-gate stacks for non-volatile memories Erlbacher T, Jank MPM, Lemberger M, Bauer AJ, Ryssel H Thin Solid Films, 516(21), 7727, 2008 |
7 |
Ellipsometric analysis of mixed metal oxides thin films Buiu O, Davey W, Lu Y, Mitrovic IZ, Hall S Thin Solid Films, 517(1), 453, 2008 |
8 |
Back side SIMS analysis of hafnium silicate Gu C, Stevie FA, Bennett J, Garcia R, GriffiS DP Applied Surface Science, 252(19), 7179, 2006 |
9 |
X-ray photoernission and X-ray absorption studies of Hf-silicate dielectric layers O'Connor R, Hughes G, Glans PA, Learmonth T, Smith KE Applied Surface Science, 253(5), 2770, 2006 |
10 |
Atomic layer chemical vapor deposition (ALCVD) of Hf and Zr silicate and aluminate high-k gate dielectric for next generation nano devices Kim WK, Nam WH, Kim SH, Rhee SW Journal of Chemical Engineering of Japan, 38(8), 578, 2005 |