화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering
Boujamaa R, Martinez E, Pierre F, Renault O, Detlefs B, Zegenhagen J, Baudot S, Gros-Jean M, Bertin F, Dubourdieu C
Applied Surface Science, 335, 71, 2015
2 Effect of crystallization on the reliability of unipolar resistive-switching in HfO2-based dielectrics
Saleh MN, Venkatachalam DK, Elliman RG
Current Applied Physics, 14, S88, 2014
3 Modelization of hafnium silicate chemical vapor deposition using tetrakis-diethyl-amino-hafnium and tetrakis-dimethyl-amino-silane
Gros-Jean M, Bouvet P, Graoui H, Chu D, Larrnagnac D
Thin Solid Films, 520(7), 2594, 2012
4 Low-Voltage P3HT Field-Effect Transistors Fabricated Using High-k Gate Insulators
Yan H, Ikeda M, Kagata T, Okuzaki H
Composite Interfaces, 18(3), 251, 2011
5 One-step growth of HfSiON films
Xia B, Fisher ML, Stemper H, Misra A
Thin Solid Films, 516(16), 5460, 2008
6 HfSiO/SiO(2)- and SiO(2)/HfSiO/SiO(2)-gate stacks for non-volatile memories
Erlbacher T, Jank MPM, Lemberger M, Bauer AJ, Ryssel H
Thin Solid Films, 516(21), 7727, 2008
7 Ellipsometric analysis of mixed metal oxides thin films
Buiu O, Davey W, Lu Y, Mitrovic IZ, Hall S
Thin Solid Films, 517(1), 453, 2008
8 Back side SIMS analysis of hafnium silicate
Gu C, Stevie FA, Bennett J, Garcia R, GriffiS DP
Applied Surface Science, 252(19), 7179, 2006
9 X-ray photoernission and X-ray absorption studies of Hf-silicate dielectric layers
O'Connor R, Hughes G, Glans PA, Learmonth T, Smith KE
Applied Surface Science, 253(5), 2770, 2006
10 Atomic layer chemical vapor deposition (ALCVD) of Hf and Zr silicate and aluminate high-k gate dielectric for next generation nano devices
Kim WK, Nam WH, Kim SH, Rhee SW
Journal of Chemical Engineering of Japan, 38(8), 578, 2005