검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers Platt CL, Li N, Li KJ, Klein TM Thin Solid Films, 518(15), 4081, 2010 |
| 2 |
Optical characterization of HfO2 by spectroscopic ellipsometry: Dispersion models and direct data inversion Sancho-Parramon J, Modreanu M, Bosch S, Stchakovsky M Thin Solid Films, 516(22), 7990, 2008 |
| 3 |
Interface engineering for Ge metal-oxide-semiconductor devices Dimoulas A, Brunco DP, Ferrari S, Seo JW, Panayiotatos Y, Sotiropoulos A, Conard T, Caymax M, Spiga S, Fanciulli M, Dieker C, Evangelou EK, Galata S, Houssa M, Heyns MM Thin Solid Films, 515(16), 6337, 2007 |
| 4 |
Application of XPS time-dependent measurement to the analysis of charge trapping phenomena in HfAlOx films Hirose K, Yamawaki M, Torii K, Kawahara T, Kawashiri S, Hattori T Applied Surface Science, 237(1-4), 411, 2004 |
| 5 |
Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films Aarik J, Aidla A, Kiisler AA, Uustare T, Sammelselg V Thin Solid Films, 340(1-2), 110, 1999 |