| 1 |
Preparation of high purity metals for advanced devices
Isshiki M, Mimura K, Uchikoshi M
Thin Solid Films, 519(24), 8451, 2011 |
| 2 |
Process methodology for the small scale production of m6N5 purity zinc using a resistance heated vacuum distillation system
Gopala A, Kipphardt H, Matschat R, Panne U
Materials Chemistry and Physics, 122(1), 151, 2010 |
| 3 |
Quantitative depth profile analysis of boron implanted silicon by pulsed radiofrequency glow discharge time-of-flight mass spectrometry
Pisonero J, Lobo L, Bordel N, Tempez A, Bensaoula A, Badi N, Sanz-Medel A
Solar Energy Materials and Solar Cells, 94(8), 1352, 2010 |
| 4 |
Application of glow discharge mass spectrometry for direct trace impurity analysis in Cu films
Lim JW, Mimura K, Isshiki A
Applied Surface Science, 227(1-4), 300, 2004 |
| 5 |
Compositional characterization of CrN films deposited by ion beam-assisted deposition process on stainless steel
Kumar S, Raju VS, Shekhar R, Arunachalam J, Khanna AS, Prasad KG
Thin Solid Films, 388(1-2), 195, 2001 |
