1 |
A modified capacitance model of RF MEMS shunt switch incorporating fringing field effects of perforated beam Guha K, Kumar M, Agarwal S, Baishya S Solid-State Electronics, 114, 35, 2015 |
2 |
Solvent-Tolerant Patterning of Poly(3-hexylthiophene) Film by Subtractive Photolithography Kim WY, Lee WY, Jeon GJ, Shim HB, Kang IK, Kim JH, Park GT, Kwon JH, Lee HC, Bae JH Molecular Crystals and Liquid Crystals, 599(1), 36, 2014 |
3 |
Investigation of gate length and fringing field effects for program and erase efficiency in gate-all-around SONOS memory cells Kim MS, Choi SJ, Moon DI, Duarte JP, Kim S, Choi YK Solid-State Electronics, 79, 7, 2013 |
4 |
A compact model of fringing field induced parasitic capacitance for deep sub-micrometer MOSFETs Liu X, Jin X, Lee JH Solid-State Electronics, 53(9), 1041, 2009 |
5 |
Fringing fields in sub-0.1 mu m fully depleted SOI MOSFETs: optimization of the device architecture Ernst T, Tinella C, Raynaud C, Cristoloveanu S Solid-State Electronics, 46(3), 373, 2002 |
6 |
Evaluation of the Dispersive Nature of Meshes Used for the Spherical-Aberration Correction of Electrostatic Lenses Kato M, Sekine T Journal of Vacuum Science & Technology A, 14(2), 453, 1996 |