| 1 |
Investigation of the structural environment and chemical bonding of fluorine in Yb-doped fluorosilicate glass optical fibres
Cavillon M, Faugas B, Zhao JJ, Kucera C, Kukuoz B, Dragic P, Qiao XS, Du JC, Ballato J
Journal of Chemical Thermodynamics, 128, 119, 2019 |
| 2 |
Characterization of sputter-induced temperature effect in fluorine doped SiO2 film deposition by high-density plasma chemical vapor deposition
Hsiao WC, Liu CP, Wang YL
Thin Solid Films, 498(1-2), 20, 2006 |
| 3 |
Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization
Cheng YL, Wang YL, Liu CP, Wu YL, Lo KY, Liu CW, Lan JK, Ay C, Feng MS
Materials Chemistry and Physics, 83(1), 150, 2004 |
| 4 |
Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application
Cheng YL, Wang YL, Liu CW, Wu YL, Lo KY, Liu CP, Lan JK
Thin Solid Films, 398-399, 533, 2001 |
| 5 |
Dependence of the performance and reliability of n-metal-oxide-silicon field effect transistors on interlayer dielectric processing
Trabzon L, Awadelkarim OO, Werking J
Journal of Vacuum Science & Technology B, 17(5), 2216, 1999 |
