| 1 |
Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry
Tryus M, Nikolaev KV, Makhotkin IA, Schubert J, Kibkalo L, Danylyuk S, Giglia A, Nicolosi P, Juschkin L
Thin Solid Films, 680, 94, 2019 |
| 2 |
Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light
Mund BK, Sturm JM, Lee CJ, Bijkerk F
Applied Surface Science, 427, 1033, 2018 |
| 3 |
Formation of H2O on a CO2 dosed Ru(0001) surface under Extreme Ultraviolet Light and H-2
Mund BK, Sturm JM, Lee CJ, Bijkerk F
Applied Surface Science, 456, 538, 2018 |
| 4 |
Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix [4] resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography
Kudo H, Fukunaga M, Shiotsuki K, Takeda H, Yamamoto H, Kozawa T, Watanabe T
Reactive & Functional Polymers, 131, 361, 2018 |
| 5 |
Induction of tin pest for cleaning tin-drop contaminated optics
Bowering N
Materials Chemistry and Physics, 198, 236, 2017 |
| 6 |
Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength
Chkhalo NI, Pariev DE, Polkovnikov VN, Salashchenko NN, Shaposhnikov A, Stroulea IL, Svechnikov MV, Vainer YA, Zuev SY
Thin Solid Films, 631, 106, 2017 |
| 7 |
An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects
Iida S, Ohya K, Hirano R, Watanabe H
Applied Surface Science, 384, 244, 2016 |
| 8 |
Mechanismand model of atomic hydrogen cleaning for different types of carbon contamination on extreme ultraviolet multilayers
Song Y, Lu QP, Gong XP
Thin Solid Films, 612, 96, 2016 |
| 9 |
Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning
Ashby PD, Olynick DL, Ogletree DF, Naulleau PP
Advanced Materials, 27(38), 5813, 2015 |
| 10 |
Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source
Dolgov A, Lopaev D, Lee CJ, Zoethout E, Medvedev V, Yakushev O, Bijkerk F
Applied Surface Science, 353, 708, 2015 |
