화학공학소재연구정보센터
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No. Article
1 Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
You SH, Kim JH, Kim CK
Korean Journal of Chemical Engineering, 39(1), 63, 2022
2 DTO 반응에 미치는 SAPO-34 촉매의 식각 처리 효과
송강, 윤영찬, 박주식, 김영호
Applied Chemistry for Engineering, 32(1), 20, 2021
3 철 샘플에 따른 구리 함유 폐에칭액의 시멘테이션 반응에 대한 연구
김보람, 장대환, 김대원
Clean Technology, 27(3), 240, 2021
4 유기 물질을 사용한 구리박막의 건식 식각에 대한 헥사플루오로이소프로판올 첨가의 영향
박성용, 임은택, 차문환, 이지수, 정지원
Korean Journal of Materials Research, 31(3), 162, 2021
5 Etching Characteristic of Graphite and Metal Substrates by Hydrocarbon Plasma in Closed Cavity
Long L, Zhou WX, Yang L, Zhu XM, Fu W
Plasma Chemistry and Plasma Processing, 41(2), 691, 2021
6 Carborane을 이용한 PS-b-P2VP 블록공중합체 나노패턴의 식각 저항성 향상
홍성우, 최홍균
Polymer(Korea), 45(2), 314, 2021
7 Consciously Constructing the Robust NiS/g-C3N4 Hybrids for Enhanced Photocatalytic Hydrogen Evolution
Lin X, Du SW, Li CH, Li GJ, Li YJ, Chen FT, Fang PF
Catalysis Letters, 150(7), 1898, 2020
8 Aluminum Oxychloride Flocculant from Copper Recycling of Waste from Printed Circuit Board Production
Kononchuk OO, Hippmann S, Bertau M, Alexeev AI
Chemie Ingenieur Technik, 92(4), 368, 2020
9 Facile Synthesis of Zinc Titanate Nanotubes via Reaction-byproduct Etching
Liu JY, Nagashima K, Yoshida H, Hosomi T, Takahashi T, Zhang GZ, Kanai M, He Y, Yanagida T
Chemistry Letters, 49(10), 1220, 2020
10 Etchant-induced Selective Hydrocarbon Formation on Copper Electrodes by Electrochemical Reduction Reaction of Carbon Dioxide
Yoshihara N, Sano A, Noda M, Kato T
Chemistry Letters, 49(10), 1121, 2020