화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Etch characteristics of HfO2 films on Si substrates
Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Norton DP, Pearton ST
Applied Surface Science, 187(1-2), 75, 2002
2 In situ measurements of ultrathin silicon oxide dissolution rates
Chopra D, Suni II
Thin Solid Films, 323(1-2), 170, 1998
3 Neutral Shadowing in Circular Cylindrical Trench Holes
Abrahamshrauner B, Chen WJ
Journal of Vacuum Science & Technology B, 14(6), 3492, 1996