검색결과 : 2건
No. | Article |
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1 |
Development of a Kinetic Model for the Moderate Temperature Chemical Vapor Deposition of SiO2 Films from Tetraethyl Orthosilicate and Oxygen Ponton S, Vergnes H, Samelor D, Sadowski D, Vahlas C, Caussat B AIChE Journal, 64(11), 3958, 2018 |
2 |
Mechanism Studies on CVD of Boron Carbide from a Gas Mixture of BCl3, CH4, and H-2 in a Dual Impinging-jet Reactor Karaman M, Sezgi NA, Dogu T, Ozbelge HO AIChE Journal, 55(3), 701, 2009 |