화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Development of a Kinetic Model for the Moderate Temperature Chemical Vapor Deposition of SiO2 Films from Tetraethyl Orthosilicate and Oxygen
Ponton S, Vergnes H, Samelor D, Sadowski D, Vahlas C, Caussat B
AIChE Journal, 64(11), 3958, 2018
2 Mechanism Studies on CVD of Boron Carbide from a Gas Mixture of BCl3, CH4, and H-2 in a Dual Impinging-jet Reactor
Karaman M, Sezgi NA, Dogu T, Ozbelge HO
AIChE Journal, 55(3), 701, 2009