검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
An Electrochemical Study on the Cathode of the Intermediate Temperature Tubular Sodium-Sulfur (NaS) Battery Nikiforidis G, Jongerden GJ, Jongerden EF, van de Sanden MCMV, Tsampas MN Journal of the Electrochemical Society, 166(2), A135, 2019 |
| 2 |
Porous titania photoelectrodes built on a Ti-web of microfibers for polymeric electrolyte membrane photoelectrochemical (PEM-PEC) cell applications Zafeiropoulos G, Stoll T, Dogan I, Mamlouk M, de Sanden MCMV, Tsampas MN Solar Energy Materials and Solar Cells, 180, 184, 2018 |
| 3 |
Silicon surface passivation by hot-wire CVD Si thin films studied by in situ surface spectroscopy Gielis JJH, Hoex B, van den Oever PJ, de Sanden MCMV, Kessels WMM Thin Solid Films, 517(12), 3456, 2009 |
| 4 |
Hot-wire deposition of a-Si : H thin films on wafer substrates studied by real-time spectroscopic ellipsometry and infrared spectroscopy van den Oever PJ, Gielis JJH, de Sanden MCMV, Kessels WMM Thin Solid Films, 516(5), 511, 2008 |
| 5 |
Production mechanisms of NH and NH2 radicals in N-2-H-2 plasmas van Helden JH, van den Oever PJ, Kessels WMM, de Sanden MCMV, Schram DC, Engeln R Journal of Physical Chemistry A, 111(45), 11460, 2007 |
| 6 |
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor Heil SBS, van Hemmen JL, Hodson CJ, Singh N, Klootwijk JH, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 25(5), 1357, 2007 |
| 7 |
Microcrystalline silicon deposition: Process stability and process control van den Donker MN, Kilper T, Grunsky D, Rech B, Houben L, Kessels WMM, de Sanden MCMV Thin Solid Films, 515(19), 7455, 2007 |
| 8 |
Attenuated total reflection infrared spectroscopy for studying adsorbates on planar model catalysts: CO adsorption on silica supported Rh nanoparticles Leewis CM, Kessels WMM, de Sanden MCMV, Van de Sanden MCM, Niemantsverdriet JW Journal of Vacuum Science & Technology A, 24(2), 296, 2006 |
| 9 |
Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry Heil SBS, Langereis E, Kemmeren A, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 23(4), L5, 2005 |