| 1 |
Characterization of fused silica surface topography in capacitively coupled atmospheric pressure plasma processing
Li D, Li N, Su X, Liu K, Ji P, Wang B
Applied Surface Science, 489, 648, 2019 |
| 2 |
Diagnostic study of argon and oxygen mixtures in dual-frequency capacitively coupled plasmas using quadrupole mass spectrometer
Jiang XZ, Li WL, Wumaier TED, Yao HB
Chemical Physics Letters, 730, 472, 2019 |
| 3 |
2D fluid simulation of capacitively coupled plasma with cylindrical electrode for roll-to-roll processing
Wi SS, Han MK, Kim DH, Lee H, Lee HJ, Lim J, Jun HS, Hwang D, Lee Y
Current Applied Physics, 15(11), 1287, 2015 |
| 4 |
Growth of few-layer graphene on SiC at low temperature with the fluorocarbon plasma pre-etching
Xu YJ, Wu XM, Ye C, Deng YH, Chen T, Ge SB
Thin Solid Films, 527, 65, 2013 |
| 5 |
Mode transition of power dissipation and plasma parameters in an asymmetric capacitive discharge
Lee SJ, Lee HC, Bang JY, Oh SJ, Chung CW
Thin Solid Films, 547, 38, 2013 |
| 6 |
The effect of the driving frequency on the optimum hole diameter for efficient multi-hole electrode RF capacitively coupled plasma
Lee H, Kim E, Lee Y, Chang H
Thin Solid Films, 547, 289, 2013 |
| 7 |
Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma
Lee JH, Kwon BS, Lee NE
Thin Solid Films, 521, 83, 2012 |
| 8 |
An overview of diagnostic methods of low-pressure capacitively coupled plasmas
Liu YX, Jiang W, Li XS, Lu WQ, Wang YN
Thin Solid Films, 521, 141, 2012 |
| 9 |
전자충격반응을 포함하는 플라즈마 화학반응을 고려한 용량결합형 산소플라즈마의 전산모사 연구
김헌창
Applied Chemistry for Engineering, 22(6), 711, 2011 |
| 10 |
Controllable wettability of poly(ethylene terephthlate) film modified by oxygen combined inductively and capacitively coupled radio-frequency plasma
Lei MK, Liu Y, Li YP
Applied Surface Science, 257(16), 7350, 2011 |
