화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 3D NAND flash memory with laterally-recessed channel (LRC) and connection gate architecture
Yun JG, Lee JD, Park BG
Solid-State Electronics, 55(1), 37, 2011
2 Stacked-nanowire device with virtual source/drain (SD-VSD) for 3D NAND flash memory application
Yun JG, Cho S, Park BG
Solid-State Electronics, 64(1), 42, 2011
3 Scaling behaviors of silicon-nitride layer for charge-trapping memory
Li DH, Yun JG, Lee JH, Park BG
Journal of Vacuum Science & Technology A, 28(4), 675, 2010
4 Effects of tunnel oxide process on SONOS flash memory characteristics
Li DH, Park IH, Yun JG, Park BG
Thin Solid Films, 518(9), 2509, 2010
5 Fabrication and characterization of fin SONOS flash memory with separated double-gate structure
Yun JG, Kim Y, Park IH, Lee JH, Kang S, Lee DH, Cho S, Kim DH, Lee GS, Sim WB, Son Y, Shin H, Lee JD, Park BG
Solid-State Electronics, 52(10), 1498, 2008
6 The effect of triple capping layer (Ti/Ni/TiN) on the electrical and structural properties of nickel monosilicide
Kim YJ, Choi CJ, Jung RJ, Oh SY, Yun JG, Lee WJ, Ji HH, Wang JS, Lee HD
Journal of the Electrochemical Society, 153(1), G35, 2006
7 A new memory effect (MSD) in fully depleted SOI MOSFETs
Bawedin M, Cristoloveanu S, Yun JG, Flandre D
Solid-State Electronics, 49(9), 1547, 2005
8 Abnormal oxidation of NiSi formed on arsenic-doped substrate
Yun JG, Ji HH, Oh SY, Bae MS, Lee HJ, Huang BF, Kim YG, Wang JS, Sung NG, Hu SB, Lee JG, Park SH, Lee HS, Ho WJ, Kim DB, Lee HD
Electrochemical and Solid State Letters, 7(4), G83, 2004