검색결과 : 12건
No. | Article |
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1 |
Fluorinated Acid Amplifiers for EUV Lithography Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL Journal of the American Chemical Society, 131(29), 9862, 2009 |
2 |
Improvement in linewidth roughness by postprocessing Chandhok M, Frasure K, Putna ES, Younkin TR, Rachmady W, Shah U, Yueh W Journal of Vacuum Science & Technology B, 26(6), 2265, 2008 |
3 |
A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films Lee CT, Yueh W, Roberts J, Henderson CL Electrochemical and Solid State Letters, 10(9), H273, 2007 |
4 |
Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance Lee CT, Henderson CL, Wang MX, Gonsalves KE, Yueh W Journal of Vacuum Science & Technology B, 25(6), 2136, 2007 |
5 |
Influence of solubility switching mechanism on resist performance in molecular glass resists Lawson RA, Lee CT, Henderson CL, Whetsell R, Tolbert L, Yueh W Journal of Vacuum Science & Technology B, 25(6), 2140, 2007 |
6 |
New anionic photoacid generator bound polymer resists for EUV lithography Wang MX, Yueh W, Gonsalves KE Macromolecules, 40(23), 8220, 2007 |
7 |
Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers Wang MX, Gonsalves KE, Yueh W, Roberts JM Macromolecular Rapid Communications, 27(18), 1590, 2006 |
8 |
The effect of photoacid generator structure on deep ultraviolet resist performance Ablaza SL, Cameron JF, Xu GY, Yueh W Journal of Vacuum Science & Technology B, 18(5), 2543, 2000 |
9 |
A non-outer sphere mechanism for the ionization of aryl vinyl sulfides by triarylaminium salts Bauld NL, Aplin JT, Yueh W, Loinaz A Journal of the American Chemical Society, 119(47), 11381, 1997 |
10 |
Cation-Radical Polymerization - A Fundamentally New Polymerization Mechanism Bauld NL, Aplin JT, Yueh W, Sarker H, Bellville DJ Macromolecules, 29(10), 3661, 1996 |