화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Fluorinated Acid Amplifiers for EUV Lithography
Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL
Journal of the American Chemical Society, 131(29), 9862, 2009
2 Improvement in linewidth roughness by postprocessing
Chandhok M, Frasure K, Putna ES, Younkin TR, Rachmady W, Shah U, Yueh W
Journal of Vacuum Science & Technology B, 26(6), 2265, 2008
3 A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films
Lee CT, Yueh W, Roberts J, Henderson CL
Electrochemical and Solid State Letters, 10(9), H273, 2007
4 Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance
Lee CT, Henderson CL, Wang MX, Gonsalves KE, Yueh W
Journal of Vacuum Science & Technology B, 25(6), 2136, 2007
5 Influence of solubility switching mechanism on resist performance in molecular glass resists
Lawson RA, Lee CT, Henderson CL, Whetsell R, Tolbert L, Yueh W
Journal of Vacuum Science & Technology B, 25(6), 2140, 2007
6 New anionic photoacid generator bound polymer resists for EUV lithography
Wang MX, Yueh W, Gonsalves KE
Macromolecules, 40(23), 8220, 2007
7 Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers
Wang MX, Gonsalves KE, Yueh W, Roberts JM
Macromolecular Rapid Communications, 27(18), 1590, 2006
8 The effect of photoacid generator structure on deep ultraviolet resist performance
Ablaza SL, Cameron JF, Xu GY, Yueh W
Journal of Vacuum Science & Technology B, 18(5), 2543, 2000
9 A non-outer sphere mechanism for the ionization of aryl vinyl sulfides by triarylaminium salts
Bauld NL, Aplin JT, Yueh W, Loinaz A
Journal of the American Chemical Society, 119(47), 11381, 1997
10 Cation-Radical Polymerization - A Fundamentally New Polymerization Mechanism
Bauld NL, Aplin JT, Yueh W, Sarker H, Bellville DJ
Macromolecules, 29(10), 3661, 1996