화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl-2/BCl3 Neutral Beam Etching
Yeon JK, Lim WS, Park JB, Kwon NY, Kim SI, Min KS, Chung IS, Kim YW, Yeom GY
Journal of the Electrochemical Society, 158(5), D254, 2011
2 Fabrication of nano-crystalline silicon thin film at low temperature by using a neutral beam deposition method
Kang SK, Jeon MH, Park JY, Lee HC, Park BJ, Yeon JK, Yeom GY
Journal of Crystal Growth, 312(14), 2145, 2010
3 Highly Selective and Low Damage Etching of GaAs/AlGaAs Heterostructure using Cl-2/O-2 Neutral Beam
Park BJ, Yeon JK, Lim WS, Kang SK, Bae JW, Yeom GY, Jhon MS, Shin SH, Chang KS, Song JI, Lee YT, Jang JH
Plasma Chemistry and Plasma Processing, 30(5), 633, 2010