화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Effect of concentric slanted pad groove patterns on slurry flow during chemical mechanical planarization
Rosales-Yeomans D, Lee H, Suzuki T, Philipossian A
Thin Solid Films, 520(6), 2224, 2012
2 Studying the effect of temperature on the copper oxidation process using hydrogen peroxide for use in multi-step chemical mechanical planarization models
DeNardis D, Rosales-Yeomans D, Borucki L, Philipossian A
Thin Solid Films, 518(14), 3903, 2010
3 A three-step copper chemical mechanical planarization model including the dissolution effects of a commercial slurry
DeNardis D, Rosales-Yeomans D, Borucki L, Philipossian A
Thin Solid Films, 518(14), 3910, 2010
4 Analysis of pads with slanted grooves for copper CMP
Rosales-Yeomans D, DeNardis D, Borucki L, Suzuki T, Philipossian A
Journal of the Electrochemical Society, 155(10), H750, 2008
5 Design and evaluation of pad grooves for copper CMP
Rosales-Yeomans D, DeNardis D, Borucki L, Philipossian A
Journal of the Electrochemical Society, 155(10), H797, 2008
6 Evaluation of pad groove designs under reduced slurry flow rate conditions during copper CMP
Rosales-Yeomans D, DeNardis D, Borucki L, Suzuki T, Sampurno Y, Philipossian A
Journal of the Electrochemical Society, 155(10), H812, 2008
7 Implications of wafer-size scale-up on frictional, thermal, and kinetic attributes of interlayer dielectric CMP process
Rosales-Yeomans D, Borucki L, Doi T, Lujan L, Philipossian A
Journal of the Electrochemical Society, 153(4), G272, 2006
8 Characterization of copper-hydrogen peroxide film growth kinetics
DeNardis D, Rosales-Yeomans D, Borucki L, Philipossian A
Thin Solid Films, 513(1-2), 311, 2006
9 Effect of pad groove designs on the frictional and removal rate characteristics of ILD CMP
Rosales-Yeomans D, Doi T, Kinoshita M, Suzuki T, Philipossian A
Journal of the Electrochemical Society, 152(1), G62, 2005
10 Small bodies of the solar system
Yeomans D
Nature, 404(6780), 829, 2000