검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Influence of glass substrate surface roughness on extreme ultraviolet reflectivity of Mo/Si multilayer Miyagaki S, Yamanashi H, Yamaguchi A, Nishiyama L Journal of Vacuum Science & Technology B, 22(6), 3063, 2004 |
| 2 |
Prediction of placement error of extreme ultraviolet lithography mask by simulation model with equivalent layout pattern Chiba A, Hoshino B, Takahashi M, Yamanashi H, Hoko H, Lee BT, Yoneda T, Ito M, Ogawa T, Okazaki S Journal of Vacuum Science & Technology B, 19(6), 2621, 2001 |
| 3 |
Resist Pattern Fluctuation Limits in Extreme-Ultraviolet Lithography Scheckler EW, Ogawa T, Yamanashi H, Soga T, Ito M Journal of Vacuum Science & Technology B, 12(4), 2361, 1994 |