검색결과 : 4건
No. | Article |
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1 |
Quantitative analysis of nano-defects in thin film encapsulation layer by Cu electrodeposition Chu K, Bae KD, Song BG, Kim J, Park YY, Xianyu W, Lee CS, Sohn Y Applied Surface Science, 453, 31, 2018 |
2 |
Write current reduction in transition metal oxide based resistance-change memory Ahn SE, Lee MJ, Park Y, Kang BS, Lee CB, Kim KH, Seo S, Suh DS, Kim DC, Hur J, Xianyu W, Stefanovich G, Yin HA, Yoo IK, Lee AH, Park JB, Baek IG, Park BH Advanced Materials, 20(5), 924, 2008 |
3 |
HfO2 gate insulator formed by atomic layer deposition for thin-film-transistors Jeong SW, Lee HJ, Kim KS, You MT, Roh Y, Noguchi T, Xianyu W, Jung J Thin Solid Films, 515(12), 5109, 2007 |
4 |
Effects of annealing temperature on the characteristics of ALD-deposited HfO2 in MIM capacitors Jeong SW, Lee HJ, Kim KS, You MT, Roh Y, Noguchi T, Xianyu W, Jung J Thin Solid Films, 515(2), 526, 2006 |