화학공학소재연구정보센터
검색결과 : 37건
No. Article
1 Screening effects in metal sculptured thin films studied with terahertz Mueller matrix ellipsometry
Hofmann T, Knight S, Sekora D, Schmidt D, Herzinger CM, Woollam JA, Schubert E, Schubert M
Applied Surface Science, 421, 513, 2017
2 Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry
Mock A, Carlson T, VanDerslice J, Mohrmann J, Woollam JA, Schubert E, Schubert M
Applied Surface Science, 421, 663, 2017
3 Terahertz ellipsometry and terahertz optical-Hall effect
Hofmann T, Herzinger CM, Tedesco JL, Gaskill DK, Woollam JA, Schubert M
Thin Solid Films, 519(9), 2593, 2011
4 Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells
Saenger MF, Sun J, Schadel M, Hilfiker J, Schubert M, Woollam JA
Thin Solid Films, 518(7), 1830, 2010
5 Optical modeling of iridium thin film erosion under oxygen plasma exposure
Yan L, Woollam JA
Journal of Vacuum Science & Technology A, 22(5), 2177, 2004
6 Gold-alumina cermet photothermal films
Woods BW, Thompson DW, Woollam JA
Thin Solid Films, 469-470, 31, 2004
7 Progress in spectroscopic ellipsometry: Applications from vacuum ultraviolet to infrared
Hilfiker JN, Bungay CL, Synowicki RA, Tiwald TE, Herzinger CM, Johs B, Pribil GK, Woollam JA
Journal of Vacuum Science & Technology A, 21(4), 1103, 2003
8 Oxygen plasma effects on optical properties of ZnSe films
Yan L, Woollam JA, Franke E
Journal of Vacuum Science & Technology A, 20(3), 693, 2002
9 Study of surface chemical changes and erosion rates for CV-1144-0 silicone under electron cyclotron resonance oxygen plasma exposure
Yan L, Gao X, Bungay C, Woollam JA
Journal of Vacuum Science & Technology A, 19(2), 447, 2001
10 Mechanical, geometrical, and electrical characterization of silicon membranes for open stencil masks
Sossna E, Degen A, Rangelow IW, Drzik M, Hudek P, Tiwald TE, Woollam JA
Journal of Vacuum Science & Technology B, 19(6), 2665, 2001