검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
The use of angle resolved XPS to measure the fractional coverage of high-kappa dielectric materials on silicon and silicon dioxide surfaces Mack P, White RG, Wolstenholme J, Conard T Applied Surface Science, 252(23), 8270, 2006 |
| 2 |
X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface Vitchev RG, Pireaux JJ, Conard T, Bender H, Wolstenholme J, Defranoux C Applied Surface Science, 235(1-2), 21, 2004 |
| 3 |
Influence of morphology on the stability of LiNiO2 Li W, Currie JC, Wolstenholme J Journal of Power Sources, 68(2), 565, 1997 |