검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale Duan HG, Manfrinato VR, Yang JKW, Winston D, Cord BM, Berggren KK Journal of Vacuum Science & Technology B, 28(6), C6H11, 2010 |
| 2 |
Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist Duan HG, Winston D, Yang JKW, Cord BM, Manfrinato VR, Berggren KK Journal of Vacuum Science & Technology B, 28(6), C6C58, 2010 |
| 3 |
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, Stern LA, Vladar AE, Postek MT, Mondol MK, Yang JKW, Berggren KK Journal of Vacuum Science & Technology B, 27(6), 2702, 2009 |