검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Optimization of plasma density and radial uniformity of a point-cusp magnetic field applied capacitive plasma Wickramanayaka S, Nakagawa Y, Sago Y, Numasawa Y Journal of Vacuum Science & Technology A, 18(3), 823, 2000 |
| 2 |
Mechanism of amorphous silica film formation from tetraethoxysilane in atomic oxygen-induced chemical vapor deposition Wrobel AM, Walkiewicz-Pietrzykowska A, Wickramanayaka S, Hatanaka Y Journal of the Electrochemical Society, 145(8), 2866, 1998 |
| 3 |
High-Quality SiO2 Depositions from Teos by ECR Plasma Sano K, Hayashi S, Wickramanayaka S, Hatanaka Y Thin Solid Films, 281-282, 397, 1996 |
| 4 |
Preparation and Characterization of Copper-Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate Aoki T, Wickramanayaka S, Wrobel AM, Nakanishi Y, Hatanaka Y Journal of the Electrochemical Society, 142(1), 166, 1995 |
| 5 |
Preparation and Deposition Mechanism of A-SiC-H Films by Using Hexamethyldisilane in a Remote H-2 Plasma Wickramanayaka S, Hatanaka Y, Nakanishi Y, Wrobel AM Journal of the Electrochemical Society, 141(10), 2910, 1994 |