검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography van Delft FCMJM, Weterings JP, van Langen-Suurling AK, Romijn H Journal of Vacuum Science & Technology B, 18(6), 3419, 2000 |