검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
High-density, inductively coupled plasma etch of sub half-micron critical layers : Transistor polysilicon gate definition and contact formation Westerheim AC, Jones RD, Mager PJ, Dubash JH, Dalton TJ, Goss MW, Baum SK, Dass SK Journal of Vacuum Science & Technology B, 16(5), 2699, 1998 |
| 2 |
Integration of chemical vapor deposition titanium nitride for 0.25 mu m contacts and vias Westerheim AC, Bulger JM, Whelan CS, Sriram TS, Elliott LJ, Maziarz JJ Journal of Vacuum Science & Technology B, 16(5), 2729, 1998 |
| 3 |
Substrate Bias Effects in High-Aspect-Ratio SiO2 Contact Etching Using an Inductively-Coupled Plasma Reactor Westerheim AC, Labun AH, Dubash JH, Arnold JC, Sawin HH, Yuwang V Journal of Vacuum Science & Technology A, 13(3), 853, 1995 |