검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Investigations into the mechanism of adsorption of carbon nanotubes onto aminopropylsiloxane functionalized surfaces Burgin TP, Lewenstein JC, Werho D Langmuir, 21(14), 6596, 2005 |
| 2 |
Spontaneous oxide reduction in metal stacks Qin W, Volinsky AA, Werho D, Theodore ND, Kottke M, Ramiah C Thin Solid Films, 473(2), 236, 2005 |
| 3 |
Impact of deposition and annealing temperature on material and electrical characteristics of ALD HfO2 Triyoso D, Liu R, Roan D, Ramon M, Edwards NV, Gregory R, Werho D, Kulik J, Tam G, Irwin E, Wang XD, La LB, Hobbs C, Garcia R, Baker J, White BE, Tobin P Journal of the Electrochemical Society, 151(10), F220, 2004 |
| 4 |
Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments Triyoso DH, Hegde RI, Grant J, Fejes P, Liu R, Roan D, Ramon M, Werho D, Rai R, La LB, Baker J, Garza C, Guenther T, White BE, Tobin PJ Journal of Vacuum Science & Technology B, 22(4), 2121, 2004 |
| 5 |
Stable titanium silicide formation on field oxide after BF2 ion implantation Mollat M, Demkov AA, Fejes P, Werho D Journal of Vacuum Science & Technology B, 19(2), 372, 2001 |
| 6 |
Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces Pianetta P, Baur K, Singh A, Brennan S, Kerner J, Werho D, Wang J Thin Solid Films, 373(1-2), 222, 2000 |
| 7 |
Is Ti Contamination in Si Wafer Processing an Issue Chang LH, Cowden WG, Christiansen J, Werho D, Theodore ND Journal of the Electrochemical Society, 143(7), 2353, 1996 |