검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Plasma polymerized methylsilane. III. Process optimization for 193 nm lithography applications Joubert O, Fuard D, Monget C, Weidman T Journal of Vacuum Science & Technology B, 18(2), 793, 2000 |
| 2 |
Single layer chemical vapor deposition photoresist for 193 nm deep ultraviolet photolithography Nault M, Weidman T, Sugiarto D, Mui D, Lee C, Yang J Journal of Vacuum Science & Technology B, 16(6), 3730, 1998 |
| 3 |
Plasma-Polymerized All-Dry Resist Process for 0.25 Mu-M Photolithography Joubert O, Weidman T, Joshi A, Cirelli R, Stein S, Lee JT, Vaidya S Journal of Vacuum Science & Technology B, 12(6), 3909, 1994 |