검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Plasma implanted ultra shallow junction boron depth profiles: Effect of plasma chemistry and sheath conditions Walther S, Godet L, Buyuklimanli T, Weeman J Journal of Vacuum Science & Technology B, 24(1), 489, 2006 |
| 2 |
Evaluation of charging damage test structures for ion implantation processes Goeckner MJ, Felch SB, Weeman J, Mehta S, Reedholm JS Journal of Vacuum Science & Technology A, 17(4), 1501, 1999 |