검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet lithography based nanofabrication using a bilevel photoresist Talin AA, Cardinale GF, Wallow TI, Dentinger P, Pathak S, Chinn D, Folk DR Journal of Vacuum Science & Technology B, 22(2), 781, 2004 |
| 2 |
Application of "transfer-free" Suzuki coupling protocols toward the synthesis of "unambiguously linear" poly(p-phenylenes) Goodson FE, Wallow TI, Novak BM Macromolecules, 31(7), 2047, 1998 |
| 3 |
Mechanistic studies on the aryl-aryl interchange reaction of ArPdL2I (L = triarylphosphine) complexes Goodson FE, Wallow TI, Novak BM Journal of the American Chemical Society, 119(51), 12441, 1997 |
| 4 |
Resist design concepts for 193 nm lithography : Opportunities for innovation and invention Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW Journal of Vacuum Science & Technology B, 15(6), 2528, 1997 |
| 5 |
Synthesis of Cycloolefin Maleic-Anhydride Alternating Copolymers for 193 nm Imaging Houlihan FM, Wallow TI, Nalamasu O, Reichmanis E Macromolecules, 30(21), 6517, 1997 |