검색결과 : 1건
No. | Article |
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1 |
Raised source/drains for 50 nm MOSFETs using a silane/dichlorosilane mixture for selective epitaxy Waite AM, Lloyd NS, Osman K, Zhang W, Ernst T, Achard H, Wang Y, Deleonibus S, Hernment PLF, Bagnall DM, Evans AGR, Ashburn P Solid-State Electronics, 49(4), 529, 2005 |