1 |
First-principles study of the effect of Cr and Al on the oxidation resistance of WSi2 Wang SL, Pan Y, Lin YH Chemical Physics Letters, 698, 211, 2018 |
2 |
Superior lithium storage of Si/WSi2 composite prepared via one step co-reduction of multi-phase oxide Peng WJ, Guo HJ, Wang ZX, Li XH, Wang JX, Yan GC, Zhou Y Journal of Electroanalytical Chemistry, 826, 84, 2018 |
3 |
Design, formation, and property of high emissivity WSi2-Si-glass hybrid coating on fibrous ZrO2 ceramic for reusable thermal protection system Shao GF, Wu XD, Cui S, Jiao J, Shen XD Solar Energy Materials and Solar Cells, 172, 301, 2017 |
4 |
Charge loss in WSi2 nanocrystals nonvolatile memory with SiO2/Si3N4/SiO2 tunnel layer Lee DU, Lee HJ, Kim EK, You HW, Cho WJ Current Applied Physics, 11(2), E6, 2011 |
5 |
Electrical properties of WSi2 nanocrystal memory with SiO2/Si3N4/SiO2 tunnel barriers Seo KB, Lee DU, Han SJ, Kim EK, You HW, Cho WJ Current Applied Physics, 10(1), E5, 2010 |
6 |
XTEM characterization of tungsten implanted SiC thin films on silicon for field emission devices Lindner JKN, Tsang WM, Wong SP, Xu JB, Wilson IH Thin Solid Films, 427(1-2), 417, 2003 |
7 |
Formation and Mechanism of Dimple/Pit on Si Substrate During WSix/Poly-Si Gate Stack Etch Pan PH, Liu L Journal of Vacuum Science & Technology B, 15(5), 1752, 1997 |
8 |
Ellipsometric Studies of Polycrystalline Molybdenum Silicide Thin-Films Srinivas G, Vankar VD Materials Research Bulletin, 31(11), 1331, 1996 |
9 |
Gate Oxide Degradation Caused by Anomalous Oxidation of Bf2 Ion-Implanted Mosi2 on Polycrystalline Silicon Kato J, Takeuchi M, Tanaka K Journal of the Electrochemical Society, 141(9), 2552, 1994 |
10 |
Chemically Vapor-Deposited Tungsten Silicide Films Using Dichlorosilane in a Single-Wafer Reactor - Growth, Properties, and Thermal-Stability Telford SG, Eizenberg M, Chang M, Sinha AK, Gow TR Journal of the Electrochemical Society, 140(12), 3689, 1993 |