화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Impact of silica-substrate chemistry on tantalum nitride thin films deposited by atomic layer deposition: Microstructure, chemistry and electrical behaviors
Volpi F, Cadix L, Berthome G, Coindeau S, Encinas T, Jourdan N, Blanquet E
Thin Solid Films, 669, 392, 2019
2 Elastic properties of tensile nitrogen-plasma-treated multilayer silicon nitride films
Braccini M, Volpi F, Devos A, Raymond G, Benoit D, Morin P
Thin Solid Films, 551, 120, 2014
3 Gaseous Phase Study of the Zr-Organometallic ALD Precursor TEMAZ by Mass Spectrometry
Monnier D, Nuta I, Chatillon C, Gros-Jean M, Volpi F, Blanquet E
Journal of the Electrochemical Society, 156(1), H71, 2009
4 Nucleation and evolution of Si1-xGex islands on Si(001)
Volpi F, Portavoce A, Ronda A, Shi Y, Gay JM, Berbezier I
Thin Solid Films, 380(1-2), 46, 2000
5 Sb segregation in Si and SiGe: effect on the growth of self-organised Ge dots
Portavoce A, Volpi F, Ronda A, Gas P, Berbezier I
Thin Solid Films, 380(1-2), 164, 2000