화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Microwave Interferometry of Chemically Active Plasma of RF Discharge in Mixtures Based on Fluorides of Silicon and Germanium
Kornev RA, Sennikov PG, Sintsov SV, Vodopyanov AV
Plasma Chemistry and Plasma Processing, 37(6), 1655, 2017
2 Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24 GHz) plasma from silicon tetrafluoride precursor
Mansfeld DA, Vodopyanov AV, Golubev SV, Sennikov PG, Mochalov LA, Andreev BA, Drozdov YN, Drozdov MN, Shashkin VI, Bulkine P, Cabarrocas PRI
Thin Solid Films, 562, 114, 2014