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| No. | Article |
|---|---|
| 1 |
Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms Posseme N, Chevolleau T, Bouyssou R, David T, Arnal V, Barnes JP, Verove C, Joubert O Journal of Vacuum Science & Technology B, 28(4), 809, 2010 |