화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Influence of hydrogen plasma surface treatment of Si substrate on nickel silicide formation
Vengurlekar A, Balasubramanian S, Ashok S, Theodore D, Chi DZ
Journal of Vacuum Science & Technology B, 24(3), 1449, 2006
2 Enhancement of He-induced cavities in silicon by hydrogen plasma treatment
Liu CL, Ntsoenzok E, Vengurlekar A, Ashok S, Alquier D, Ruault MO, Dubois C
Journal of Vacuum Science & Technology B, 23(3), 990, 2005