화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Impact of the electrodeposition chemistry used for TSV filling on the microstructural and thermo-mechanical response of Cu
Okoro C, Labie R, Vanstreels K, Franquet A, Gonzalez M, Vandevelde B, Beyne E, Vandepitte D, Verlinden B
Journal of Materials Science, 46(11), 3868, 2011
2 Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent
Tsvetanova D, Vos R, Vanstreels K, Radisic D, Sonnemans R, Berry I, Waldfried C, Mattson D, DeLuca J, Vereecke G, Mertens PW, Parac-Vogt TN, Heyns MM
Journal of the Electrochemical Society, 158(2), H150, 2011
3 Degradation of 248 nm Deep UV Photoresist by Ion Implantation
Tsvetanova D, Vos R, Vereecke G, Parac-Vogt TN, Clemente F, Vanstreels K, Radisic D, Conard T, Franquet A, Jivanescu M, Nguyen DAP, Stesmans A, Brijs B, Mertens P, Heyns MM
Journal of the Electrochemical Society, 158(8), H785, 2011
4 Nanoindentation study of thin plasma enhanced chemical vapor deposition SiCOH low-k films modified in He/H-2 downstream plasma
Vanstreels K, Urbanowicz AM
Journal of Vacuum Science & Technology B, 28(1), 173, 2010
5 Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon
Eyben P, Clemente F, Vanstreels K, Pourtois G, Clarysse T, Duriau E, Hantschel T, Sankaran K, Mody J, Vandervorst W, Mylvaganam K, Zhang LC
Journal of Vacuum Science & Technology B, 28(2), 401, 2010
6 Effect of Porogen Residue on Chemical, Optical, and Mechanical Properties of CVD SiCOH Low-k Materials
Urbanowicz AM, Vanstreels K, Shamiryan D, De Gendt S, Baklanova MR
Electrochemical and Solid State Letters, 12(8), H292, 2009
7 Copper deposition and subsequent grain structure evolution in narrow lines
Brongersma SH, D'Haen J, Vanstreels K, DeCeuninck W, Vervoort I, Maex K
Materials Science Forum, 426-4, 2485, 2003