검색결과 : 33건
| No. | Article |
|---|---|
| 1 |
In- and out-plane transport properties of chemical vapor deposited TiO2 anatase films Miquelot A, Youssef L, Villeneuve-Faure C, Prud'homme N, Dragoe N, Nada A, Rouessac V, Roualdes S, Bassil J, Zakhour M, Nakhl M, Vahlas C Journal of Materials Science, 56(17), 10458, 2021 |
| 2 |
Large temperature range model for the atmospheric pressure Chemical vapor deposition of Silicon dioxide films on thermosensitive substrates Topka KC, Chliavoras GA, Senocq F, Vergnes H, Samelor D, Sadowski D, Vahlas C, Caussat B Chemical Engineering Research & Design, 161, 146, 2020 |
| 3 |
Efficient, durable protection of the Ti6242S titanium alloy against high-temperature oxidation through MOCVD processed amorphous alumina coatings Sam?lor D, Baggetto L, Laloo R, Turq V, Gleizes AN, Duguet T, Monceau D, Vahlas C Journal of Materials Science, 55(11), 4883, 2020 |
| 4 |
TiO2 nanotree films for the production of green H-2 by solar water splitting: From microstructural and optical characteristics to the photocatalytic properties Miquelot A, Debieu O, Rouessac V, Villeneuve C, Prud'homme N, Cure J, Constantoudis V, Papavieros G, Roualdes S, Vahlas C Applied Surface Science, 494, 1127, 2019 |
| 5 |
Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si Gakis GP, Vahlas C, Vergnes H, Dourdain S, Tison Y, Martinez H, Bour J, Ruch D, Boudouvis AG, Caussat B, Scheid E Applied Surface Science, 492, 245, 2019 |
| 6 |
Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water Gakis GP, Vergnes H, Scheid E, Vahlas C, Boudouvis AG, Caussat B Chemical Engineering Science, 195, 399, 2019 |
| 7 |
Development of a Kinetic Model for the Moderate Temperature Chemical Vapor Deposition of SiO2 Films from Tetraethyl Orthosilicate and Oxygen Ponton S, Vergnes H, Samelor D, Sadowski D, Vahlas C, Caussat B AIChE Journal, 64(11), 3958, 2018 |
| 8 |
Computational Fluid Dynamics simulation of the ALD of alumina from TMA and H2O in a commercial reactor Gakis GP, Vergnes H, Scheid E, Vahlas C, Caussat B, Boudouvis AG Chemical Engineering Research & Design, 132, 795, 2018 |
| 9 |
Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA Psarellis GM, Aviziotis IG, Duguet T, Vahlas C, Koronaki ED, Boudouvis AG Chemical Engineering Science, 177, 464, 2018 |
| 10 |
Chemical vapor deposition of low reflective cobalt (II) oxide films Amin-Chalhoub E, Duguet T, Samelor D, Debieu O, Ungureanu E, Vahlas C Applied Surface Science, 360, 540, 2016 |