1 |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH Current Applied Physics, 19(10), 1068, 2019 |
2 |
Removing the effect of blooming from potential energy measurement by employing total internal reflection microscopy integrated with video microscopy Cao F, Gong XJ, He CX, Ngai T Journal of Colloid and Interface Science, 503, 142, 2017 |
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Higher LRRFIP1 expression in glioblastoma multiforme is associated with better response to teniposide, a type II topoisomerase inhibitor Li WQ, Yu HY, Li YM, Wang X, He J, Yan HZ, Yang DH, Wu XJ, Hou LJ, Liu HM, Xia CY, Lu YC Biochemical and Biophysical Research Communications, 446(4), 1261, 2014 |
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An integrated advanced process control framework using run-to-run control, virtual metrology and fault detection Fan SKS, Chang YJ Journal of Process Control, 23(7), 933, 2013 |
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Vapor-Liquid-Equilibria and Densities for the System Butane Plus Hexacontane Nieuwoudt I Journal of Chemical and Engineering Data, 41(5), 1024, 1996 |