화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH
Current Applied Physics, 19(10), 1068, 2019
2 Removing the effect of blooming from potential energy measurement by employing total internal reflection microscopy integrated with video microscopy
Cao F, Gong XJ, He CX, Ngai T
Journal of Colloid and Interface Science, 503, 142, 2017
3 Higher LRRFIP1 expression in glioblastoma multiforme is associated with better response to teniposide, a type II topoisomerase inhibitor
Li WQ, Yu HY, Li YM, Wang X, He J, Yan HZ, Yang DH, Wu XJ, Hou LJ, Liu HM, Xia CY, Lu YC
Biochemical and Biophysical Research Communications, 446(4), 1261, 2014
4 An integrated advanced process control framework using run-to-run control, virtual metrology and fault detection
Fan SKS, Chang YJ
Journal of Process Control, 23(7), 933, 2013
5 Vapor-Liquid-Equilibria and Densities for the System Butane Plus Hexacontane
Nieuwoudt I
Journal of Chemical and Engineering Data, 41(5), 1024, 1996