검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition Kim K, Oh IK, Kim H, Lee Z Applied Surface Science, 425, 781, 2017 |
| 2 |
Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition Muta H, Mizuno K, Nishida S, Kuribayashi S Thin Solid Films, 523, 41, 2012 |
| 3 |
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films Kim YJ, Choi YS, Choi IS, Han JG Current Applied Physics, 11(5), S54, 2011 |
| 4 |
Large area VHF plasma production by a balanced power feeding method Nishimiya T, Takeuchi Y, Yamauchi Y, Takatsuka H, Shioya T, Muta H, Kawai Y Thin Solid Films, 516(13), 4430, 2008 |
| 5 |
World's largest amorphous silicon photovoltaic module Takatsuka H, Yamauchi Y, Kawamura K, Mashima H, Takeuchi Y Thin Solid Films, 506, 13, 2006 |
| 6 |
Development of large-area a-Si : H films deposition using controlled VHF plasma Kawamura K, Mashima H, Takeuchi Y, Takano A, Noda M, Yonekura Y, Takatsuka H Thin Solid Films, 506, 22, 2006 |
| 7 |
Large area VHF plasma production using a ladder-shaped electrode Mashima H, Yamakoshi H, Kawamura K, Takeuchi Y, Noda M, Yonekura Y, Takatsuka H, Uchino S, Kawai Y Thin Solid Films, 506, 512, 2006 |
| 8 |
Microcrystalline silicon solar cells fabricated by VHF plasma CVD method Saito K, Sano M, Okabe S, Sugiyama S, Ogawa K Solar Energy Materials and Solar Cells, 86(4), 565, 2005 |
| 9 |
Optical emission spectroscopy investigation on very high frequency plasma and its glow discharge mechanism during the microcrystalline silicon deposition Yang HD, Wu CY, Huang J, Ding RQ, Zhao Y, Geng XH, Xiong SZ Thin Solid Films, 472(1-2), 125, 2005 |
| 10 |
VHF plasma processing for in-line deposition systems Rudiger J, Brechtel H, Kottwitz A, Kuske J, Stephan U Thin Solid Films, 427(1-2), 16, 2003 |