검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Evaluation of outgassing from a fluorinated resist for 157 nm lithography Irie S, Hagiwara T, Fujii K, Itakura Y, Kawasa Y, Egawa K, Uchino I, Sumitani A, Itani T Journal of Vacuum Science & Technology B, 22(6), 3513, 2004 |