화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Wet Silylation and Oxygen Plasma Development of Photoresists - A Mature and Versatile Lithographic Process for Microelectronics and Microfabrication
Gogolides E, Tzevelekis D, Grigoropoulos S, Tegou E, Hatzakis M
Journal of Vacuum Science & Technology B, 14(5), 3332, 1996
2 Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist
Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F
Journal of Vacuum Science & Technology B, 12(6), 3914, 1994