검색결과 : 2건
No. | Article |
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1 |
Wet Silylation and Oxygen Plasma Development of Photoresists - A Mature and Versatile Lithographic Process for Microelectronics and Microfabrication Gogolides E, Tzevelekis D, Grigoropoulos S, Tegou E, Hatzakis M Journal of Vacuum Science & Technology B, 14(5), 3332, 1996 |
2 |
Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F Journal of Vacuum Science & Technology B, 12(6), 3914, 1994 |