검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Profile evolution during polysilicon gate etching with low-pressure high-density Cl-2/HBr/O-2 plasma chemistries Tuda M, Shintani K, Ootera H Journal of Vacuum Science & Technology A, 19(3), 711, 2001 |
| 2 |
Large-diameter microwave plasma source excited by azimuthally symmetric surface waves Tuda M, Ono K, Ootera H, Tsuchihashi M, Hanazaki M, Komemura T Journal of Vacuum Science & Technology A, 18(3), 840, 2000 |
| 3 |
Dynamics of plasma-surface interactions and feature profile evolution during pulsed plasma etching Ono K, Tuda M Thin Solid Films, 374(2), 208, 2000 |
| 4 |
New-type microwave plasma source excited by azimuthally symmetric surface waves with magnetic multicusp fields Tuda M, Ono K Journal of Vacuum Science & Technology A, 16(5), 2832, 1998 |
| 5 |
Effects of Etch Products and Surface Oxidation on Profile Evolution During Electron-Cyclotron-Resonance Plasma-Etching of Poly-Si Tuda M, Ono K, Nishikawa K Journal of Vacuum Science & Technology B, 14(5), 3291, 1996 |